Thaum tshav kub kub hloov zaj duab xis yog ib tug nruab nrab cov ntaub ntawv uas siv nyob rau hauv lub tshav kub hloov printing kom ua tiav nto kho kom zoo nkauj. Nws muaj cov ntaub ntawv polyethylene rov qab, txheej zoo nkauj, txheej tiv thaiv, txheej tso tawm, thiab txheej kub yaj nplaum nplaum. Nws hloov cov qauv mus rau saum npoo ntawm lub tsev cov ntaub ntawv, rooj tog zaum, thiab lwm yam substrates los ntawm cua sov thiab siab, ua ib tug hnav-resistant thiab lub teeb- resistant decorating txheej. Cov txheej txheem yuav tsum tau tswj kub (140℃-180 degree), siab (4-6 kg / cm²), thiab ceev kom muaj zog adhesion thiab tiv thaiv oxidation thiab deformation. Cov khoom siv no tsim nyog rau ntau yam ntaub ntawv xws li hlau thiab yas, thiab yuav tsum tau khaws cia ncaj, tiv thaiv los ntawm noo noo thiab cua sov.
Tsoos tshav kub hloov cov yeeb yaj kiab muaj kev txwv vim qhov tsis muaj zog ntawm cov txheej txheem tiv thaiv thiab tsis yooj yim rau kev hloov mus rau qhov chaw nkhaus. Kev hloov pauv cov yeeb yaj kiab tshiab patent tau npaj rau xyoo 2024 siv cov ntawv tshaj tawm -dual curing technology, optimizing cov khoom sib piv ntawm cov cab kuj thiab txheej tiv thaiv. Nws kho cov txheej txheem zoo nkauj thiab cov nplaum nplaum hauv cov theem uas siv lub teeb ci ultraviolet lossis lub tshav kub, txhim kho lub zog tensile kom tau raws li qhov xav tau ntawm kev hloov pauv ntawm qhov chaw nkhaus. Cov thev naus laus zis no siv cov khoom sib xyaw uas muaj cov dawb radicals thiab cationic photoinitiators, ntsuas kev lag luam kev lag luam nrog kev txhim kho cov yeeb yaj kiab.
